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1 505560030460 505560.030460.平面微波放電低壓 505560.030460.planar microwave discharge low pressures 5000.505560.030460.平面微波放電低壓.planar microwave discharge low pressures.平面マイクロ波放電低圧 -> 411 505560
2 505560030470 505560.030470.o2_h2_低壓微波放電 505560.030470.o2 h2 low pressure microwave discharge 5000.505560.030470.o2_h2_低壓微波放電.o2 h2 low pressure microwave discharge.o2_h2_低圧マイクロ波放電 -> 411 505560
3 505560030510 505560.030510.以低壓表面波放電 505560.030510.discharges at low pressures surface wave 5000.505560.030510.以低壓表面波放電.discharges at low pressures surface wave.低圧での放電_表面波 -> 411 505560
4 505560030520 505560.030520.直流氬放電低壓 505560.030520.direct current argon discharges low pressures 5000.505560.030520.直流氬放電低壓.direct current argon discharges low pressures.直流アルゴン放電低圧 -> 411 505560
5 505560030610 505560.030610.介質阻擋放電等離子體 505560.030610.dielectric barrier discharge plasma 5000.505560.030610.介質阻擋放電等離子體.dielectric barrier discharge plasma.誘電体バリア放電プラズマ -> 411 505560
6 505560030620 505560.030620.強電場放電環境壓力 505560.030620.strong electric field discharge ambient pressure 5000.505560.030620.強電場放電環境壓力.strong electric field discharge ambient pressure.強電界放電_周囲圧力 -> 411 505560
7 505560030630 505560.030630.射頻放電等離子體 505560.030630.radio frequency discharge plasma 5000.505560.030630.射頻放電等離子體.radio frequency discharge plasma.高周波放電プラズマ -> 411 505560
8 505560030640 505560.030640.氮放電等離子體 505560.030640.nitrogen discharge plasma 5000.505560.030640.氮放電等離子體.nitrogen discharge plasma.窒素放電プラズマ -> 411 505560
9 505570 電漿/等離子放電 Plasma Discharge 505570.電漿/等離子放電.Plasma Discharge -> 7561 5000
10 505570001001 505570.001001.電漿/等離子放電 505570.001001.Plasma Discharge 5000.505570.001001.電漿/等離子放電.Plasma Discharge.プラズマ/プラズマ放電 -> 5686 505570
11 505570010010 505570.010010.等離子放電 505570.010010.Plasma Discharge 5000.505570.010010.等離子放電.Plasma Discharge.プラズマ放電 -> 12 505570
12 505570010020 505570.010020.等離子放電形成 505570.010020.plasma discharge formation 5000.505570.010020.等離子放電形成.plasma discharge formation.プラズマ放電形成 -> 12 505570
13 505570010030 505570.010030.等離子放電形成岩畫 505570.010030.plasma discharge formation petroglyphs 5000.505570.010030.等離子放電形成岩畫.plasma discharge formation petroglyphs.プラズマ放電形成ペトログリフ -> 12 505570
14 505570010040 505570.010040.等離子放電形成珀羅 505570.010040.plasma discharge formation perot 5000.505570.010040.等離子放電形成珀羅.plasma discharge formation perot.プラズマ放電形成ペロー -> 12 505570
15 505570010050 505570.010050.等離子放電原理 505570.010050.principles of plasma discharges 5000.505570.010050.等離子放電原理.principles of plasma discharges.プラズマ放電の原理 -> 12 505570
16 505570010060 505570.010060.液體等離子放電 505570.010060.liquid plasma discharge 5000.505570.010060.液體等離子放電.liquid plasma discharge.液体プラズマ放電 -> 12 505570
17 505570010070 505570.010070.高壓放電等離子 505570.010070.high voltage electrical discharge plasma 5000.505570.010070.高壓放電等離子.high voltage electrical discharge plasma.高電圧放電プラズマ -> 12 505570
18 505570010110 505570.010110.高壓放電等離子通道 505570.010110.high voltage discharge plasma channels 5000.505570.010110.高壓放電等離子通道.high voltage discharge plasma channels.高電圧放電プラズマチャンネル -> 12 505570
19 505570010120 505570.010120.高壓放電等離子燈絲 505570.010120.high voltage discharge plasma filament 5000.505570.010120.高壓放電等離子燈絲.high voltage discharge plasma filament.高電圧放電プラズマ_フィラメント -> 12 505570
20 505570010130 505570.010130.高壓放電等離子體 505570.010130.high voltage electrical discharge plasma 5000.505570.010130.高壓放電等離子體.high voltage electrical discharge plasma.高電圧放電プラズマ -> 12 505570
21 505570010140 505570.010140.放電等離子技術廢水修復 505570.010140.discharge plasma technology wastewater remediation 5000.505570.010140.放電等離子技術廢水修復.discharge plasma technology wastewater remediation.放電プラズマ技術廃水修復 -> 12 505570
22 505570010150 505570.010150.放電等離子反應器 505570.010150.discharge plasma reactor 5000.505570.010150.放電等離子反應器.discharge plasma reactor.放電プラズマリアクター -> 12 505570
23 505570010160 505570.010160.放電等離子氧化脫色 505570.010160.discharge plasma oxidative decoloration 5000.505570.010160.放電等離子氧化脫色.discharge plasma oxidative decoloration.放電プラズマ酸化脱色 -> 12 505570
24 505570010210 505570.010210.屏障放電等離子處理廢水污染物 505570.010210.barrier discharge plasma treatment wastewater pollutants 5000.505570.010210.屏障放電等離子處理廢水污染物.barrier discharge plasma treatment wastewater pollutants.バリア放電プラズマ 505570
25 505570010220 505570.010220.屏障放電等離子驅動器 505570.010220.barrier discharge plasma actuators 5000.505570.010220.屏障放電等離子驅動器.barrier discharge plasma actuators.バリア放電プラズマアクチュエータ -> 12 505570
26 505570010230 505570.010230.降解機制屏障放電等離子體 505570.010230.degradation mechanisms barrier discharge plasma 5000.505570.010230.降解機制屏障放電等離子體.degradation mechanisms barrier discharge plasma.分解メカニズム_バリア放電_プラズマ - 505570
27 505570010240 505570.010240.降解的放電等離子體增強 505570.010240.discharge plasma enhancement of the degradation 5000.505570.010240.降解的放電等離子體增強.discharge plasma enhancement of the degradation.分解の放電プラズマ強化 -> 12 505570
28 505570010250 505570.010250.降解特性放電等離子工藝 505570.010250.degradation characteristics discharge plasma process 5000.505570.010250.降解特性放電等離子工藝.degradation characteristics discharge plasma process.劣化_特性_放電_プラズマ_プロ 505570
29 505570010260 505570.010260.高壓大氣冷等離子 505570.010260.high voltage atmospheric cold plasma 5000.505570.010260.高壓大氣冷等離子.high voltage atmospheric cold plasma.高電圧大気圧コールドプラズマ -> 12 505570
30 505570010310 505570.010310.加熱束等離子放電 505570.010310.heating beam plasma discharge 5000.505570.010310.加熱束等離子放電.heating beam plasma discharge.加熱ビーム_プラズマ放電 -> 12 505570
31 505570010320 505570.010320.交叉束等離子放電 505570.010320.crossed beam plasma discharge 5000.505570.010320.交叉束等離子放電.crossed beam plasma discharge.クロスビームプラズマ放電 -> 12 505570
32 505570010330 505570.010330.水處理等離子放電液體 505570.010330.water treatment plasma discharge in liquid 5000.505570.010330.水處理等離子放電液體.water treatment plasma discharge in liquid.液体中の水処理プラズマ放電 -> 12 505570
33 505570010340 505570.010340.束等離子放電 505570.010340.beam plasma discharge 5000.505570.010340.束等離子放電.beam plasma discharge.ビームプラズマ放電 -> 12 505570
34 505570010350 505570.010350.束等離子放電磁場 505570.010350.beam plasma discharge magnetic field 5000.505570.010350.束等離子放電磁場.beam plasma discharge magnetic field.ビームプラズマ放電磁場 -> 12 505570
35 505570010360 505570.010360.束等離子放電振盪 505570.010360.beam plasma discharge oscillations 5000.505570.010360.束等離子放電振盪.beam plasma discharge oscillations.ビームプラズマ放電振動 -> 12 505570
36 505570010370 505570.010370.束等離子放電點火 505570.010370.beam plasma discharge ignition 5000.505570.010370.束等離子放電點火.beam plasma discharge ignition.ビームプラズマ放電点火 -> 12 505570
37 505570010410 505570.010410.超聲空化等離子放電 505570.010410.ultrasonic cavitation plasma discharge 5000.505570.010410.超聲空化等離子放電.ultrasonic cavitation plasma discharge.超音波キャビテーション_プラズマ放電 -> 12 505570
38 505570010420 505570.010420.電感耦合等離子放電 505570.010420.inductively coupled plasma discharge 5000.505570.010420.電感耦合等離子放電.inductively coupled plasma discharge.誘導結合プラズマ放電 -> 12 505570
39 505570010430 505570.010430.電子束等離子放電 505570.010430.electron beam plasma discharge 5000.505570.010430.電子束等離子放電.electron beam plasma discharge.電子線プラズマ放電 -> 12 505570
40 505570010440 505570.010440.脈衝等離子放電 505570.010440.pulsed plasma discharge 5000.505570.010440.脈衝等離子放電.pulsed plasma discharge.パルスプラズマ放電 -> 12 505570
41 505570010450 505570.010450.脈衝等離子放電大電流 505570.010450.pulsed plasma discharge high current 5000.505570.010450.脈衝等離子放電大電流.pulsed plasma discharge high current.パルスプラズマ放電_大電流 -> 12 505570
42 505570010460 505570.010460.優先生產等離子放電 505570.010460.preferential production plasma discharge 5000.505570.010460.優先生產等離子放電.preferential production plasma discharge.優先生産プラズマ放電 -> 12 505570
43 505570010470 505570.010470.離子束等離子放電 505570.010470.ion beam plasma discharge 5000.505570.010470.離子束等離子放電.ion beam plasma discharge.イオンビームプラズマ放電 -> 12 505570
44 505570010510 505570.010510.實驗室束等離子放電 505570.010510.laboratory beam plasma discharge 5000.505570.010510.實驗室束等離子放電.laboratory beam plasma discharge.実験用ビーム_プラズマ放電 -> 12 505570
45 505570020010 505570.020010.電感耦合等離子炬 505570.020010.inductively coupled plasma torches 5000.505570.020010.電感耦合等離子炬.inductively coupled plasma torches.誘導結合プラズマトーチ -> 12 505570
46 505570020020 505570.020020.電感耦合等離子體mattauch 505570.020020.inductively coupled plasma mattauch 5000.505570.020020.電感耦合等離子體mattauch.inductively coupled plasma mattauch.誘導結合プラズマ_マタウフ -> 12 505570
47 505570020030 505570.020030.電感耦合等離子體串聯質譜 505570.020030.inductively coupled plasma tandem mass spectrometry 5000.505570.020030.電感耦合等離子體串聯質譜.inductively coupled plasma tandem mass spectrometry.誘導結合プラズマ_タンデム質量分 505570
48 505570020040 505570.020040.電感耦合等離子體系統 505570.020040.inductively coupled plasma system 5000.505570.020040.電感耦合等離子體系統.inductively coupled plasma system.誘導結合プラズマ_システム -> 12 505570
49 505570020050 505570.020050.電感耦合等離子體源 505570.020050.inductively coupled plasma sources 5000.505570.020050.電感耦合等離子體源.inductively coupled plasma sources.誘導結合プラズマソース -> 12 505570
50 505570020060 505570.020060.電感耦合等離子體中的滯後現象 505570.020060.hysteresis in inductively coupled plasma 5000.505570.020060.電感耦合等離子體中的滯後現象.hysteresis in inductively coupled plasma.誘導結合プラズマのヒステリシス -> 12 505570
51 505570020070 505570.020070.電感耦合等離子體放電光譜化學分析 505570.020070.inductively coupled plasma discharges spectrochemical analysis 5000.505570.020070.電感耦合等離子體放電光譜化學分析.inductively coupled plasma discharges spectrochemical analysis.誘 505570
52 505570020110 505570.020110.電感耦合等離子體放電三元混合物 505570.020110.inductively coupled plasma discharges ternary mixture 5000.505570.020110.電感耦合等離子體放電三元混合物.inductively coupled plasma discharges ternary mixture.誘導結合プラズマ放電三 505570
53 505570020120 505570.020120.電感耦合等離子體放電模式轉換 505570.020120.inductively coupled plasma discharge mode transitions 5000.505570.020120.電感耦合等離子體放電模式轉換.inductively coupled plasma discharge mode transitions.誘導結合プラズマ放電モー 505570
54 505570020130 505570.020130.電感耦合等離子體發生器 505570.020130.inductively coupled plasma generator 5000.505570.020130.電感耦合等離子體發生器.inductively coupled plasma generator.誘導結合プラズマ発生器 -> 12 505570
55 505570020140 505570.020140.電容模式電感耦合等離子體 505570.020140.capacitive mode inductively coupled plasmas 5000.505570.020140.電容模式電感耦合等離子體.capacitive mode inductively coupled plasmas.容量モード_誘導結合プラズマ -> 12 505570
56 505570020150 505570.020150.peratt_等離子放電形成 505570.020150.peratt plasma discharge formation 5000.505570.020150.peratt_等離子放電形成.peratt plasma discharge formation.ペラットプラズマ放電形成 -> 12 505570
57 505570020160 505570.020160.液體等離子體放電合成 505570.020160.liquid plasma discharge synthesis 5000.505570.020160.液體等離子體放電合成.liquid plasma discharge synthesis.液体プラズマ放電合成 -> 12 505570
58 505570020170 505570.020170.液體等離子體放電納米粒子 505570.020170.liquid plasma discharge nanoparticles 5000.505570.020170.液體等離子體放電納米粒子.liquid plasma discharge nanoparticles.液体プラズマ放電_ナノ粒子 -> 12 505570
59 505570020210 505570.020210.乙醇液體等離子體放電 505570.020210.ethanol liquid plasma discharge 5000.505570.020210.乙醇液體等離子體放電.ethanol liquid plasma discharge.エタノール液体プラズマ放電 -> 12 505570
60 505570020220 505570.020220.化肥生產等離子排放 505570.020220.fertilizer production plasma discharge 5000.505570.020220.化肥生產等離子排放.fertilizer production plasma discharge.肥料生産プラズマ放電 -> 12 505570
61 505570020230 505570.020230.甘油液體等離子體放電的氧化 505570.020230.oxidation of glycerol liquid plasma discharge 5000.505570.020230.甘油液體等離子體放電的氧化.oxidation of glycerol liquid plasma discharge.グリセロールの酸化_液体プラズマ放電 -> 505570
62 505570020240 505570.020240.輝光放電等離子體 505570.020240.glow discharge plasma 5000.505570.020240.輝光放電等離子體.glow discharge plasma.グロー放電プラズマ -> 12 505570
63 505570020250 505570.020250.功率吸收電感耦合等離子體 505570.020250.power absorption inductively coupled plasmas 5000.505570.020250.功率吸收電感耦合等離子體.power absorption inductively coupled plasmas.電力吸収誘導結合プラズマ -> 12 505570
64 505570020260 505570.020260.甲烷的脈衝等離子體轉化 505570.020260.pulsed plasma conversion of methane 5000.505570.020260.甲烷的脈衝等離子體轉化.pulsed plasma conversion of methane.メタンのパルスプラズマ変換 -> 12 505570
65 505570020270 505570.020270.弱碰撞感應耦合等離子體 505570.020270.weakly collisional inductively coupled plasma 5000.505570.020270.弱碰撞感應耦合等離子體.weakly collisional inductively coupled plasma.弱衝突誘導結合プラズマ -> 12 505570
66 505570020310 505570.020310.蝕刻材料常壓等離子射流 505570.020310.etching materials atmospheric pressure plasma jet 5000.505570.020310.蝕刻材料常壓等離子射流.etching materials atmospheric pressure plasma jet.エッチング材料_大気圧プラズマ_ジェッ 505570
67 505570020320 505570.020320.低頻電感耦合等離子體 505570.020320.low frequency inductively coupled plasma 5000.505570.020320.低頻電感耦合等離子體.low frequency inductively coupled plasma.低周波誘導結合プラズマ -> 12 505570
68 505570020330 505570.020330.低壓感應耦合等離子體放電 505570.020330.low pressure inductively coupled plasma discharge 5000.505570.020330.低壓感應耦合等離子體放電.low pressure inductively coupled plasma discharge.低圧誘導結合プラズマ放電 -> 12 505570
69 505570020340 505570.020340.定量元素分析電感耦合等離子體 505570.020340.quantitative elemental analyses inductively coupled plasmas 5000.505570.020340.定量元素分析電感耦合等離子體.quantitative elemental analyses inductively coupled plasmas.定量元素分析 505570
70 505570020350 505570.020350.等離子鞘形成 505570.020350.plasma sheath formation 5000.505570.020350.等離子鞘形成.plasma sheath formation.プラズマシース形成 -> 12 505570
71 505570020360 505570.020360.等離子天線飛秒激光燈絲 505570.020360.plasma antenna femtosecond laser filaments 5000.505570.020360.等離子天線飛秒激光燈絲.plasma antenna femtosecond laser filaments.プラズマ_アンテナ_フェムト秒レーザー_フィラメント 505570
72 505570020370 505570.020370.同軸脈衝等離子推進器放電 505570.020370.coaxial pulsed plasma thruster electrical discharge 5000.505570.020370.同軸脈衝等離子推進器放電.coaxial pulsed plasma thruster electrical discharge.同軸パルスプラズマスラスター放電 505570
73 505570020410 505570.020410.納秒脈衝等離子體放電 505570.020410.nanosecond pulsed plasma discharge 5000.505570.020410.納秒脈衝等離子體放電.nanosecond pulsed plasma discharge.ナノ秒パルスプラズマ放電 -> 12 505570
74 505570020420 505570.020420.排放等離子廠廢水處理 505570.020420.discharge plasma mill wastewater treatment 5000.505570.020420.排放等離子廠廢水處理.discharge plasma mill wastewater treatment.放電プラズマミル廃水処理 -> 12 505570
75 505570020430 505570.020430.非熱脈衝等離子體 505570.020430.non-thermal pulsed plasma 5000.505570.020430.非熱脈衝等離子體.non-thermal pulsed plasma.非熱パルスプラズマ -> 12 505570
76 505570020440 505570.020440.表面介質阻擋放電等離子體 505570.020440.surface dielectric barrier discharge plasma 5000.505570.020440.表面介質阻擋放電等離子體.surface dielectric barrier discharge plasma.表面誘電体バリア放電プラズマ -> 12 505570
77 505570020450 505570.020450.放電等離子體 505570.020450.electrical discharge plasma 5000.505570.020450.放電等離子體.electrical discharge plasma.放電プラズマ -> 12 505570
78 505570020460 505570.020460.放電等離子體形成衝擊波 505570.020460.discharge plasma formation of shock waves 5000.505570.020460.放電等離子體形成衝擊波.discharge plasma formation of shock waves.衝撃波の放電プラズマ形成 -> 12 505570
79 505570020470 505570.020470.脈衝等離子推進器 505570.020470.pulsed plasma thruster 5000.505570.020470.脈衝等離子推進器.pulsed plasma thruster.パルスプラズマスラスター -> 12 505570
80 505570020510 505570.020510.脈衝等離子體聚合 505570.020510.pulsed plasma polymerizations 5000.505570.020510.脈衝等離子體聚合.pulsed plasma polymerizations.パルスプラズマ重合 -> 12 505570
81 505570020520 505570.020520.氣相表面放電等離子體 505570.020520.gas phase surface discharge plasma 5000.505570.020520.氣相表面放電等離子體.gas phase surface discharge plasma.気相表面放電プラズマ -> 12 505570
82 505570020530 505570.020530.苯酚放電等離子體反應器的降解 505570.020530.degradation of phenol discharge plasma reactor 5000.505570.020530.苯酚放電等離子體反應器的降解.degradation of phenol discharge plasma reactor.フェノール放電プラズマリアクターの劣化 505570
83 505570030010 505570.030010.微波等離子放電 505570.030010.microwave plasma discharge 5000.505570.030010.微波等離子放電.microwave plasma discharge.マイクロ波プラズマ放電 -> 24 505570
84 505570030020 505570.030020.微波等離子金剛石沉積反應器 505570.030020.microwave plasma diamond deposition reactor 5000.505570.030020.微波等離子金剛石沉積反應器.microwave plasma diamond deposition reactor.マイクロ波プラズマ_ダイヤモンド堆積リアクター 505570
85 505570030030 505570.030030.微波等離子反應器 505570.030030.microwave plasma reactors 5000.505570.030030.微波等離子反應器.microwave plasma reactors.マイクロ波プラズマリアクター -> 24 505570
86 505570030040 505570.030040.微波等離子炬 505570.030040.microwave plasma torch 5000.505570.030040.微波等離子炬.microwave plasma torch.マイクロ波プラズマトーチ -> 24 505570
87 505570030050 505570.030050.微波等離子體化學氣相沉積反應器 505570.030050.microwave plasma chemical vapor deposition reactor 5000.505570.030050.微波等離子體化學氣相沉積反應器.microwave plasma chemical vapor deposition reactor.マイクロ波プラズマ化学蒸着リ 505570
88 505570030060 505570.030060.微波等離子體放電簡述 505570.030060.microwave plasma discharge simplified description 5000.505570.030060.微波等離子體放電簡述.microwave plasma discharge simplified description.マイクロ波プラズマ放電の簡単な説明 -> 505570
89 505570030070 505570.030070.微波等離子體放電單晶金剛石 505570.030070.microwave plasma discharge single crystal diamond 5000.505570.030070.微波等離子體放電單晶金剛石.microwave plasma discharge single crystal diamond.マイクロ波プラズマ放電_単結晶ダイ 505570
90 505570030110 505570.030110.大氣壓微波等離子體 505570.030110.atmospheric pressure microwave plasma 5000.505570.030110.大氣壓微波等離子體.atmospheric pressure microwave plasma.大気圧マイクロ波プラズマ -> 24 505570
91 505570030120 505570.030120.等離子體放電模擬微波場 505570.030120.plasma discharge simulations microwave field 5000.505570.030120.等離子體放電模擬微波場.plasma discharge simulations microwave field.プラズマ放電シミュレーション_マイクロ波場 -> 505570
92 505570030130 505570.030130.射頻等離子串聯共振效應 505570.030130.radio frequency plasma series resonance effect 5000.505570.030130.射頻等離子串聯共振效應.radio frequency plasma series resonance effect.高周波プラズマシリーズ共鳴効果 -> 12 505570
93 505570030140 505570.030140.共振振盪射頻放電 505570.030140.resonance oscillations radio frequency discharges 5000.505570.030140.共振振盪射頻放電.resonance oscillations radio frequency discharges.共鳴振動_無線周波数放電 -> 12 505570
94 505570030150 505570.030150.低壓射頻放電 505570.030150.low pressure radio frequency discharges 5000.505570.030150.低壓射頻放電.low pressure radio frequency discharges.低圧無線周波放電 -> 12 505570
95 505570030160 505570.030160.電特性射頻放電 505570.030160.electrical characterization radio frequency discharges 5000.505570.030160.電特性射頻放電.electrical characterization radio frequency discharges.電気的特性評価_無線周波数放電 -> 505570
96 505570030170 505570.030170.電容性射頻放電 505570.030170.capacitive radio frequency discharges 5000.505570.030170.電容性射頻放電.capacitive radio frequency discharges.容量性無線周波数放電 -> 12 505570
97 505570030210 505570.030210.二氧化碳離解射頻放電 505570.030210.co2 dissociation radio frequency discharge 5000.505570.030210.二氧化碳離解射頻放電.co2 dissociation radio frequency discharge.CO2_解離_無線周波数放電 -> 12 505570
98 505570030220 505570.030220.非線性等離子體動力學射頻放電 505570.030220.nonlinear plasma dynamics radio frequency discharges 5000.505570.030220.非線性等離子體動力學射頻放電.nonlinear plasma dynamics radio frequency discharges.非線形プラズマダイナミクス 505570
99 505570030230 505570.030230.平行板射頻放電 505570.030230.parallel plate radio frequency discharges 5000.505570.030230.平行板射頻放電.parallel plate radio frequency discharges.平行平板無線周波数放電 -> 12 505570
100 505570035010 505570.035010.射頻等離子放電 505570.035010.radio frequency plasma discharge 5000.505570.035010.射頻等離子放電.radio frequency plasma discharge.高周波プラズマ放電 -> 12 505570
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