|
| 1 |
505430250510 |
505430.250510.超強磁場 |
505430.250510.super-strong magnetic fields |
5000.505430.250510.超強磁場.super-strong magnetic fields.超強力な磁場 -> 2631 |
505430 |
|
| 2 |
505430250520 |
505430.250520.低強度磁場 |
505430.250520.low intensity magnetic fields |
5000.505430.250520.低強度磁場.low intensity magnetic fields.低強度の磁場 -> 12 |
505430 |
|
| 3 |
505430250530 |
505430.250530.低頻磁場 |
505430.250530.low frequency magnetic fields |
5000.505430.250530.低頻磁場.low frequency magnetic fields.低周波磁場 -> 12 |
505430 |
|
| 4 |
505430250540 |
505430.250540.電力行業磁場暴露 |
505430.250540.electric utility industry magnetic field exposures |
5000.505430.250540.電力行業磁場暴露.electric utility industry magnetic field exposures.電気事業業界の磁界ばく露 -> 12 |
505430 |
|
| 5 |
505430250550 |
505430.250550.等離子體中的高強度磁場 |
505430.250550.high intensity magnetic fields in plasmas |
5000.505430.250550.等離子體中的高強度磁場.high intensity magnetic fields in plasmas.プラズマ中の高強度磁場 -> 12 |
505430 |
|
| 6 |
505430250560 |
505430.250560.半平面感應磁場 |
505430.250560.half plane induced magnetic field |
5000.505430.250560.半平面感應磁場.half plane induced magnetic field.半平面誘導磁場 -> 12 |
505430 |
|
| 7 |
505430250570 |
505430.250570.不均勻磁場 |
505430.250570.nonuniform magnetic field |
5000.505430.250570.不均勻磁場.nonuniform magnetic field.不均一な磁場 -> 12 |
505430 |
|
| 8 |
505430250610 |
505430.250610.用磁場刺激神經 |
505430.250610.neural stimulation with magnetic fields |
5000.505430.250610.用磁場刺激神經.neural stimulation with magnetic fields.磁場による神経刺激 -> 12 |
505430 |
|
| 9 |
505430250620 |
505430.250620.雷電實驗磁場測量系統 |
505430.250620.lightning experiment magnetic field measuring system |
5000.505430.250620.雷電實驗磁場測量系統.lightning experiment magnetic field measuring system.雷実験磁場測定システム -> 12 |
505430 |
|
| 10 |
505430250630 |
505430.250630.匯總分析磁場 |
505430.250630.pooled analysis magnetic fields |
5000.505430.250630.匯總分析磁場.pooled analysis magnetic fields.プールされた分析磁場 -> 12 |
505430 |
|
| 11 |
505430250640 |
505430.250640.靜磁場 |
505430.250640.static magnetic fields |
5000.505430.250640.靜磁場.static magnetic fields.静磁場 -> 12 |
505430 |
|
| 12 |
505430250650 |
505430.250650.產生強磁場 |
505430.250650.production of intense magnetic fields |
5000.505430.250650.產生強磁場.production of intense magnetic fields.強烈な磁場の生成 -> 12 |
505430 |
|
| 13 |
505430260010 |
505430.260010.數值模擬雲內閃電 |
505430.260010.numerical simulations intracloud lightning flashes |
5000.505430.260010.數值模擬雲內閃電.numerical simulations intracloud lightning flashes.数値シミュレーションクラウド内の稲妻の閃光 |
505430 |
|
| 14 |
505430260020 |
505430.260020.數值模擬確定性方法 |
505430.260020.numerical simulation deterministic methods |
5000.505430.260020.數值模擬確定性方法.numerical simulation deterministic methods.数値シミュレーションの決定論的手法 -> 12 |
505430 |
|
| 15 |
505430260030 |
505430.260030.數值模擬閃電引發 |
505430.260030.numerical simulations lightning initiation |
5000.505430.260030.數值模擬閃電引發.numerical simulations lightning initiation.数値シミュレーション雷の開始 -> 12 |
505430 |
|
| 16 |
505430260040 |
505430.260040.數值模擬閃電起爆機制 |
505430.260040.numerical simulation lightning initiation mechanism |
5000.505430.260040.數值模擬閃電起爆機制.numerical simulation lightning initiation mechanism.数値シミュレーション雷開始メカニズム |
505430 |
|
| 17 |
505430260050 |
505430.260050.數值模擬閃電電磁場耦合 |
505430.260050.numerical simulations lightning electromagnetic field coupling |
5000.505430.260050.數值模擬閃電電磁場耦合.numerical simulations lightning electromagnetic field coupling.数値シミュレ |
505430 |
|
| 18 |
505430260060 |
505430.260060.數值模擬超級單體雷暴 |
505430.260060.numerical simulations supercell thunderstorm |
5000.505430.260060.數值模擬超級單體雷暴.numerical simulations supercell thunderstorm.数値シミュレーションスーパーセル雷雨 -> 12 |
505430 |
|
| 19 |
505430260070 |
505430.260070.數值模擬雷暴放電 |
505430.260070.numerical simulation thunderstorm discharges |
5000.505430.260070.數值模擬雷暴放電.numerical simulation thunderstorm discharges.数値シミュレーションによる雷雨の放出 -> 12 |
505430 |
|
| 20 |
505430260110 |
505430.260110.數值雲模型閃電參數化 |
505430.260110.numerical cloud models lightning parameterization |
5000.505430.260110.數值雲模型閃電參數化.numerical cloud models lightning parameterization.数値クラウドモデルの雷のパラメータ化 - |
505430 |
|
| 21 |
505430260120 |
505430.260120.數值建模研究 |
505430.260120.numerical modeling study |
5000.505430.260120.數值建模研究.numerical modeling study.数値モデリング研究 -> 12 |
505430 |
|
| 22 |
505430260130 |
505430.260130.數值電磁場分析 |
505430.260130.numerical electromagnetic field analysis |
5000.505430.260130.數值電磁場分析.numerical electromagnetic field analysis.数値電磁界解析 -> 12 |
505430 |
|
| 23 |
505430260140 |
505430.260140.數值電磁場分析閃電電流 |
505430.260140.numerical electromagnetic field analysis lightning current |
5000.505430.260140.數值電磁場分析閃電電流.numerical electromagnetic field analysis lightning current.数値電磁界解析雷電流 |
505430 |
|
| 24 |
505430260150 |
505430.260150.數值表達式電磁場 |
505430.260150.numerical expressions electromagnetic fields |
5000.505430.260150.數值表達式電磁場.numerical expressions electromagnetic fields.数式電磁界 -> 12 |
505430 |
|
| 25 |
505430260160 |
505430.260160.數值表達式電場 |
505430.260160.numerical expression electric fields |
5000.505430.260160.數值表達式電場.numerical expression electric fields.数式電界 -> 12 |
505430 |
|
| 26 |
505430260170 |
505430.260170.觀察性和實驗性研究 |
505430.260170.observational and experimental study |
5000.505430.260170.觀察性和實驗性研究.observational and experimental study.観察研究と実験研究 -> 12 |
505430 |
|
| 27 |
505430260210 |
505430.260210.尋找高能輻射 |
505430.260210.search for high energy radiation |
5000.505430.260210.尋找高能輻射.search for high energy radiation.高エネルギー放射線を検索する -> 1203 |
505430 |
|
| 28 |
505430260220 |
505430.260220.超短高強度激光脈衝 |
505430.260220.ultrashort high intensity laser pulses |
5000.505430.260220.超短高強度激光脈衝.ultrashort high intensity laser pulses.超短高強度レーザーパルス -> 4451 |
505430 |
|
| 29 |
505430260230 |
505430.260230.峰值功率能量耗散 |
505430.260230.peak power energy dissipation |
5000.505430.260230.峰值功率能量耗散.peak power energy dissipation.ピーク電力エネルギー散逸 -> 12 |
505430 |
|
| 30 |
505430260240 |
505430.260240.量子力學計算任意方向 |
505430.260240.quantum mechanical calculation arbitrary orientation |
5000.505430.260240.量子力學計算任意方向.quantum mechanical calculation arbitrary orientation.量子力学的計算任意の方向 -> 1 |
505430 |
|
| 31 |
505430260250 |
505430.260250.領導級功率譜密度 |
505430.260250.leader stage power spectrum density |
5000.505430.260250.領導級功率譜密度.leader stage power spectrum density.リーダーステージのパワースペクトル密度 -> 12 |
505430 |
|
| 32 |
505430270010 |
505430.270010.晴空塔閃電發電 |
505430.270010.Skytree Lightning Power Generation |
5000.505430.270010.晴空塔閃電發電.Skytree Lightning Power Generation.スカイツリーライトニング發電 -> 12 |
505430 |
|
| 33 |
505430270020 |
505430.270020.脈衝發電 |
505430.270020.Pulse power generation |
5000.505430.270020.脈衝發電.Pulse power generation.パルス發電 -> 12 |
505430 |
|
| 34 |
505430270030 |
505430.270030.雪地發電 |
505430.270030.Snow power generation |
5000.505430.270030.雪地發電.Snow power generation.雪發電 -> 12 |
505430 |
|
| 35 |
505430310010 |
505430.310010.等離子放電 |
505430.310010.Plasma discharge |
5000.505430.310010.等離子放電.Plasma discharge.プラズマ放電_ -> 10004 |
505430 |
|
| 36 |
505430310020 |
505430.310020.等離子放電原理 |
505430.310020.principles of plasma discharges |
5000.505430.310020.等離子放電原理.principles of plasma discharges.プラズマ放電の原理 -> 5364 |
505430 |
|
| 37 |
505430310030 |
505430.310030.等離子放電源 |
505430.310030.plasma discharge source |
5000.505430.310030.等離子放電源.plasma discharge source.プラズマ放電源 -> 5298 |
505430 |
|
| 38 |
505430310040 |
505430.310040.等離子放電型 |
505430.310040.Plasma discharge type |
5000.505430.310040.等離子放電型.Plasma discharge type.プラズマ_放電 種類 -> 12 |
505430 |
|
| 39 |
505430310050 |
505430.310050.等離子放電形成 |
505430.310050.plasma discharge formation |
5000.505430.310050.等離子放電形成.plasma discharge formation.プラズマ放電形成 -> 12 |
505430 |
|
| 40 |
505430310060 |
505430.310060.等離子放電形成岩畫 |
505430.310060.plasma discharge formation petroglyphs |
5000.505430.310060.等離子放電形成岩畫.plasma discharge formation petroglyphs.プラズマ放電形成ペトログリフ -> 12 |
505430 |
|
| 41 |
505430310070 |
505430.310070.等離子放電_電暈放電差異 |
505430.310070.Plasma discharge Corona discharge difference |
5000.505430.310070.等離子放電_電暈放電差異.Plasma discharge Corona discharge difference.プラズマ放電_コロナ放電_違い -> 12 |
505430 |
|
| 42 |
505430310110 |
505430.310110.等離子放電_氣體放電 |
505430.310110.Plasma discharge Gas discharge |
5000.505430.310110.等離子放電_氣體放電.Plasma discharge Gas discharge.プラズマ放電_ガス放電 -> 8924 |
505430 |
|
| 43 |
505430310120 |
505430.310120.等離子放電異常的原因 |
505430.310120.Cause of abnormal plasma discharge |
5000.505430.310120.等離子放電異常的原因.Cause of abnormal plasma discharge.プラズマ 異常放電_原因 -> 12 |
505430 |
|
| 44 |
505430310130 |
505430.310130.等離子放電全局模型 |
505430.310130.plasma discharges global model |
5000.505430.310130.等離子放電全局模型.plasma discharges global model.プラズマ放電グローバルモデル -> 12 |
505430 |
|
| 45 |
505430310140 |
505430.310140.納秒脈衝等離子放電 |
505430.310140.nanosecond pulsed plasma discharge |
5000.505430.310140.納秒脈衝等離子放電.nanosecond pulsed plasma discharge.ナノ秒パルスプラズマ放電 -> 12 |
505430 |
|
| 46 |
505430310150 |
505430.310150.脈衝等離子放電 |
505430.310150.pulsed plasma discharge |
5000.505430.310150.脈衝等離子放電.pulsed plasma discharge.パルスプラズマ放電 -> 12 |
505430 |
|
| 47 |
505430310160 |
505430.310160.脈衝等離子放電大電流 |
505430.310160.pulsed plasma discharge high current |
5000.505430.310160.脈衝等離子放電大電流.pulsed plasma discharge high current.パルスプラズマ放電大電流 -> 5045 |
505430 |
|
| 48 |
505430310170 |
505430.310170.peratt_等離子放電形成 |
505430.310170.peratt plasma discharge formation |
5000.505430.310170.peratt_等離子放電形成.peratt plasma discharge formation.ペラットプラズマ放電形成 -> 12 |
505430 |
|
| 49 |
505430310210 |
505430.310210.液體等離子放電 |
505430.310210.liquid plasma discharge |
5000.505430.310210.液體等離子放電.liquid plasma discharge.液体プラズマ放電 -> 12 |
505430 |
|
| 50 |
505430310220 |
505430.310220.高密度等離子放電 |
505430.310220.high density plasma discharges |
5000.505430.310220.高密度等離子放電.high density plasma discharges.高密度プラズマ放電 -> 5467 |
505430 |
|
| 51 |
505430310230 |
505430.310230.什麼是等離子放電？ |
505430.310230.What is plasma discharge? |
5000.505430.310230.什麼是等離子放電？.What is plasma discharge?.プラズマ放電とは -> 12 |
505430 |
|
| 52 |
505430310240 |
505430.310240.束等離子放電 |
505430.310240.beam plasma discharge |
5000.505430.310240.束等離子放電.beam plasma discharge.ビームプラズマ放電 -> 2376 |
505430 |
|
| 53 |
505430310250 |
505430.310250.低溫等離子放電 |
505430.310250.low temperature plasma discharges |
5000.505430.310250.低溫等離子放電.low temperature plasma discharges.低温プラズマ放電 -> 3116 |
505430 |
|
| 54 |
505430310310 |
505430.310310.電感耦合等離子放電 |
505430.310310.inductively coupled plasma discharge |
5000.505430.310310.電感耦合等離子放電.inductively coupled plasma discharge.誘導結合プラズマ放電 -> 12 |
505430 |
|
| 55 |
505430310410 |
505430.310410.等離子化 |
505430.310410.Plasmaization |
5000.505430.310410.等離子化.Plasmaization.プラズマ化 -> 12 |
505430 |
|
| 56 |
505430310420 |
505430.310420.等離子電 |
505430.310420.Plasma electricity |
5000.505430.310420.等離子電.Plasma electricity.プラズマ 電気 -> 12 |
505430 |
|
| 57 |
505430310430 |
505430.310430.等離子閃電 |
505430.310430.Plasma lightning |
5000.505430.310430.等離子閃電.Plasma lightning.プラズマ 雷 -> 4055 |
505430 |
|
| 58 |
505430310440 |
505430.310440.等離子閃電區別 |
505430.310440.Plasma lightning difference |
5000.505430.310440.等離子閃電區別.Plasma lightning difference.プラズマ_雷 違い -> 12 |
505430 |
|
| 59 |
505430310450 |
505430.310450.等離子火焰 |
505430.310450.Plasma flame |
5000.505430.310450.等離子火焰.Plasma flame.プラズマ 炎 -> 12 |
505430 |
|
| 60 |
505430310460 |
505430.310460.等離子現象 |
505430.310460.Plasma phenomenon |
5000.505430.310460.等離子現象.Plasma phenomenon.プラズマ現象 -> 12 |
505430 |
|
| 61 |
505430310470 |
505430.310470.等離子鞘形成 |
505430.310470.plasma sheath formation |
5000.505430.310470.等離子鞘形成.plasma sheath formation.プラズマシースの形成 -> 12 |
505430 |
|
| 62 |
505430310510 |
505430.310510.等離子蝕刻基本原理 |
505430.310510.plasma etching basic principles |
5000.505430.310510.等離子蝕刻基本原理.plasma etching basic principles.プラズマエッチングの基本原理 -> 12 |
505430 |
|
| 63 |
505430310520 |
505430.310520.等離子蝕刻原理 |
505430.310520.Plasma etching principle |
5000.505430.310520.等離子蝕刻原理.Plasma etching principle.プラズマエッチング_原理 -> 12 |
505430 |
|
| 64 |
505430310530 |
505430.310530.等離子蝕刻蝕刻速度 |
505430.310530.Plasma etching Etching speed |
5000.505430.310530.等離子蝕刻蝕刻速度.Plasma etching Etching speed.プラズマエッチング_エッチングスピード -> 12 |
505430 |
|
| 65 |
505430310540 |
505430.310540.等離子體物理原理 |
505430.310540.principles of plasma physics |
5000.505430.310540.等離子體物理原理.principles of plasma physics.プラズマ物理学の原理 -> 12 |
505430 |
|
| 66 |
505430310550 |
505430.310550.等離子體密度頻率 |
505430.310550.Plasma density frequency |
5000.505430.310550.等離子體密度頻率.Plasma density frequency.プラズマ密度_周波数 -> 12 |
505430 |
|
| 67 |
505430310560 |
505430.310560.等離子溫度 |
505430.310560.Plasma temperature |
5000.505430.310560.等離子溫度.Plasma temperature.プラズマ温度 -> 12 |
505430 |
|
| 68 |
505430310570 |
505430.310570.如何製作等離子 |
505430.310570.How to make plasma |
5000.505430.310570.如何製作等離子.How to make plasma.プラズマ 作り方 -> 4343 |
505430 |
|
| 69 |
505430310610 |
505430.310610.脈衝等離子推進器 |
505430.310610.pulsed plasma thruster |
5000.505430.310610.脈衝等離子推進器.pulsed plasma thruster.パルスプラズマスラスタ -> 6280 |
505430 |
|
| 70 |
505430310620 |
505430.310620.發芽改良常壓等離子處理 |
505430.310620.germination improvement atmospheric pressure plasma treatment |
5000.505430.310620.發芽改良常壓等離子處理.germination improvement atmospheric pressure plasma treatment.發芽改善大気圧 |
505430 |
|
| 71 |
505430310630 |
505430.310630.液體脈衝等離子體法 |
505430.310630.pulsed plasma in liquid method |
5000.505430.310630.液體脈衝等離子體法.pulsed plasma in liquid method.液体法のパルスプラズマ -> 12 |
505430 |
|
| 72 |
505430310640 |
505430.310640.甲烷的脈衝等離子體轉化 |
505430.310640.pulsed plasma conversion of methane |
5000.505430.310640.甲烷的脈衝等離子體轉化.pulsed plasma conversion of methane.メタンのパルスプラズマ変換 -> 12 |
505430 |
|
| 73 |
505430310650 |
505430.310650.在液態水中形成等離子體 |
505430.310650.plasma formation in liquid water |
5000.505430.310650.在液態水中形成等離子體.plasma formation in liquid water.液体水中でのプラズマ形成 -> 12 |
505430 |
|
| 74 |
505430310660 |
505430.310660.蝕刻材料常壓等離子射流 |
505430.310660.etching materials atmospheric pressure plasma jet |
5000.505430.310660.蝕刻材料常壓等離子射流.etching materials atmospheric pressure plasma jet.エッチング材料大気圧プラズマジェット |
505430 |
|
| 75 |
505430310710 |
505430.310710.微波等離子放電 |
505430.310710.microwave plasma discharge |
5000.505430.310710.微波等離子放電.microwave plasma discharge.マイクロ波プラズマ放電 -> 4750 |
505430 |
|
| 76 |
505430310720 |
505430.310720.微波等離子反應器 |
505430.310720.microwave plasma reactors |
5000.505430.310720.微波等離子反應器.microwave plasma reactors.マイクロ波プラズマ反応器 -> 3534 |
505430 |
|
| 77 |
505430310730 |
505430.310730.微波等離子金剛石沉積反應器 |
505430.310730.microwave plasma diamond deposition reactor |
5000.505430.310730.微波等離子金剛石沉積反應器.microwave plasma diamond deposition reactor.マイクロ波プラズマダイヤモンド堆積反応器 -> |
505430 |
|
| 78 |
505430310740 |
505430.310740.微波等離子炬 |
505430.310740.microwave plasma torch |
5000.505430.310740.微波等離子炬.microwave plasma torch.マイクロ波プラズマトーチ -> 12 |
505430 |
|
| 79 |
505430310750 |
505430.310750.微波等離子體放電簡述 |
505430.310750.microwave plasma discharge simplified description |
5000.505430.310750.微波等離子體放電簡述.microwave plasma discharge simplified description.マイクロ波プラズマ放電の簡単な説明 -> |
505430 |
|
| 80 |
505430310760 |
505430.310760.微波等離子體放電單晶金剛石 |
505430.310760.microwave plasma discharge single crystal diamond |
5000.505430.310760.微波等離子體放電單晶金剛石.microwave plasma discharge single crystal diamond.マイクロ波プラズマ放電単結晶ダイヤ |
505430 |
|
| 81 |
505430310770 |
505430.310770.微波等離子體處理 |
505430.310770.microwave plasma treatment |
5000.505430.310770.微波等離子體處理.microwave plasma treatment.マイクロ波プラズマ処理 -> 12 |
505430 |
|
| 82 |
505430320010 |
505430.320010.等離子刻蝕異常放電 |
505430.320010.Plasma etching abnormal discharge |
5000.505430.320010.等離子刻蝕異常放電.Plasma etching abnormal discharge.プラズマエッチング_異常放電 -> 12 |
505430 |
|
| 83 |
505430320020 |
505430.320020.等離子蝕刻_晶圓溫度_異常放電 |
505430.320020.Plasma etching Wafer temperature Abnormal discharge |
5000.505430.320020.等離子蝕刻_晶圓溫度_異常放電.Plasma etching Wafer temperature Abnormal discharge.プラズマエッチング_ウェー |
505430 |
|
| 84 |
505430320030 |
505430.320030.等離子蝕刻輝光放電工藝 |
505430.320030.plasma etching glow discharge processes |
5000.505430.320030.等離子蝕刻輝光放電工藝.plasma etching glow discharge processes.プラズマエッチンググロー放電プロセス -> 12 |
505430 |
|
| 85 |
505430320040 |
505430.320040.等離子體放電形成珀羅 |
505430.320040.plasma discharge formation perot |
5000.505430.320040.等離子體放電形成珀羅.plasma discharge formation perot.プラズマ放電形成ペロ -> 12 |
505430 |
|
| 86 |
505430320050 |
505430.320050.等離子體放電動力學效應 |
505430.320050.plasma discharges kinetic effects |
5000.505430.320050.等離子體放電動力學效應.plasma discharges kinetic effects.プラズマ放電の運動効果 -> 12 |
505430 |
|
| 87 |
505430320060 |
505430.320060.等離子體放電模擬微波場 |
505430.320060.plasma discharge simulations microwave field |
5000.505430.320060.等離子體放電模擬微波場.plasma discharge simulations microwave field.プラズマ放電シミュレーションマイクロ波フィールド |
505430 |
|
| 88 |
505430320070 |
505430.320070.等離子體放電流體模擬 |
505430.320070.plasma discharges fluid simulations |
5000.505430.320070.等離子體放電流體模擬.plasma discharges fluid simulations.プラズマ放電流体シミュレーション -> 12 |
505430 |
|
| 89 |
505430320110 |
505430.320110.pk_4_直流放電粒子電荷 |
505430.320110.pk 4 dc discharge particle charge |
5000.505430.320110.pk_4_直流放電粒子電荷.pk 4 dc discharge particle charge.pk4dc放電粒子チャージ -> 12 |
505430 |
|
| 90 |
505430320120 |
505430.320120.介質阻擋放電等離子體致動器 |
505430.320120.dielectric barrier discharge plasma actuators |
5000.505430.320120.介質阻擋放電等離子體致動器.dielectric barrier discharge plasma actuators.誘電体バリア放電プラズマアクチュエータ - |
505430 |
|
| 91 |
505430320130 |
505430.320130.感應放電等離子現象 |
505430.320130.inductive discharges plasma phenomena |
5000.505430.320130.感應放電等離子現象.inductive discharges plasma phenomena.誘導放電プラズマ現象 -> 12 |
505430 |
|
| 92 |
505430320140 |
505430.320140.輝光放電等離子體 |
505430.320140.glow discharge plasma |
5000.505430.320140.輝光放電等離子體.glow discharge plasma.グロー放電プラズマ -> 12 |
505430 |
|
| 93 |
505430320150 |
505430.320150.高壓放電等離子體 |
505430.320150.elevated pressures discharge plasma |
5000.505430.320150.高壓放電等離子體.elevated pressures discharge plasma.高圧はプラズマを放出します -> 12 |
505430 |
|
| 94 |
505430320160 |
505430.320160.什麼是放電等離子體？ |
505430.320160.What is discharge plasma? |
5000.505430.320160.什麼是放電等離子體？.What is discharge plasma?.放電プラズマとは -> 12 |
505430 |
|
| 95 |
505430320170 |
505430.320170.阻擋放電等離子處理 |
505430.320170.barrier discharge plasma treatment |
5000.505430.320170.阻擋放電等離子處理.barrier discharge plasma treatment.バリア放電プラズマ処理 -> 12 |
505430 |
|
| 96 |
505430320210 |
505430.320210.多頻電容放電 |
505430.320210.multi-frequency capacitive discharges |
5000.505430.320210.多頻電容放電.multi-frequency capacitive discharges.多周波容量性放電 -> 12 |
505430 |
|
| 97 |
505430320220 |
505430.320220.低溫氣體放電等離子體 |
505430.320220.low temperature gas discharge plasma |
5000.505430.320220.低溫氣體放電等離子體.low temperature gas discharge plasma.低温ガス放電プラズマ -> 2875 |
505430 |
|
| 98 |
505430320230 |
505430.320230.電子動力學氣體放電 |
505430.320230.electron kinetics gas discharges |
5000.505430.320230.電子動力學氣體放電.electron kinetics gas discharges.電子動力学ガス放電 -> 12 |
505430 |
|
| 99 |
505430320240 |
505430.320240.同軸脈衝等離子推進器放電 |
505430.320240.coaxial pulsed plasma thruster electrical discharge |
5000.505430.320240.同軸脈衝等離子推進器放電.coaxial pulsed plasma thruster electrical discharge.同軸パルスプラズマスラスタ放電 |
505430 |
|
| 100 |
505430320250 |
505430.320250.頻率電容放電_高次諧波產生 |
505430.320250.frequency capacitive discharges higher harmonic generation |
5000.505430.320250.頻率電容放電_高次諧波產生.frequency capacitive discharges higher harmonic generation.周波数容量性放電 |
505430 |
