|
| 1 |
506500310510 |
506500.310510.單級升壓轉換器高電壓 |
506500.310510.single stage boost converter high voltage |
5000.506500.310510.單級升壓轉換器高電壓.single stage boost converter high voltage.単段昇圧コンバーターの高電圧 -> 24 |
506500 |
|
| 2 |
506500310520 |
506500.310520.靜電控制高壓產生器 |
506500.310520.electrostatic control high voltage generator |
5000.506500.310520.靜電控制高壓產生器.electrostatic control high voltage generator.静電制御高電圧発生器 -> 24 |
506500 |
|
| 3 |
506500310530 |
506500.310530.靜電高壓產生器 |
506500.310530.electrostatic high voltage generator |
5000.506500.310530.靜電高壓產生器.electrostatic high voltage generator.静電高電圧発生器 -> 24 |
506500 |
|
| 4 |
506500310540 |
506500.310540.靜電微馬達高壓產生器ci |
506500.310540.electrostatic micromotor high voltage generator ci |
5000.506500.310540.靜電微馬達高壓產生器ci.electrostatic micromotor high voltage generator ci.静電マイクロモーター高電圧発生器c |
506500 |
|
| 5 |
506500315100 |
506500.315100.高壓放電 |
506500.315100.high voltage discharge |
5000.506500.315100.高壓放電.high voltage discharge.高電圧放電 -> 5221 |
506500 |
|
| 6 |
506500315200 |
506500.315200.高壓存儲 |
506500.315200.high voltage storage |
5000.506500.315200.高壓存儲.high voltage storage.高電圧貯蔵 -> 4785 |
506500 |
|
| 7 |
506500315300 |
506500.315300.靜電放電 |
506500.315300.electrostatic discharge |
5000.506500.315300.靜電放電.electrostatic discharge.静電放電 -> 2479 |
506500 |
|
| 8 |
506500320010 |
506500.320010.放電 krf 雷射輻射 |
506500.320010.electric discharges krf laser radiation |
5000.506500.320010.放電 krf 雷射輻射.electric discharges krf laser radiation.放電 krf レーザー 放射線 -> 423 |
506500 |
|
| 9 |
506500320020 |
506500.320020.放電 xecl 雷射器 |
506500.320020.electric discharge xecl laser |
5000.506500.320020.放電 xecl 雷射器.electric discharge xecl laser.放電XECLレーザー -> 423 |
506500 |
|
| 10 |
506500320030 |
506500.320030.放電演化 xecl 雷射系統 |
506500.320030.discharge evolution xecl laser system |
5000.506500.320030.放電演化 xecl 雷射系統.discharge evolution xecl laser system.放電進化xeclレーザーシステム -> 423 |
506500 |
|
| 11 |
506500320035 |
506500.320035.高效運作 xecl 雷射器 |
506500.320035.efficient operation xecl laser |
5000.506500.320035.高效運作 xecl 雷射器.efficient operation xecl laser.効率的な運用 xecl レーザー -> 411 |
506500 |
|
| 12 |
506500320040 |
506500.320040.放電混合 krf 雷射系統 |
506500.320040.electric discharges hybrid krf laser system |
5000.506500.320040.放電混合 krf 雷射系統.electric discharges hybrid krf laser system.放電ハイブリッドkrfレーザーシステム -> |
506500 |
|
| 13 |
506500320050 |
506500.320050.放電紫外線激光 |
506500.320050.electrical discharges ultraviolet laser |
5000.506500.320050.放電紫外線激光.electrical discharges ultraviolet laser.放電・紫外線・レーザー -> 423 |
506500 |
|
| 14 |
506500320060 |
506500.320060.放電準分子雷射器 |
506500.320060.electric discharge excimer lasers |
5000.506500.320060.放電準分子雷射器.electric discharge excimer lasers.放電エキシマレーザー -> 423 |
506500 |
|
| 15 |
506500320070 |
506500.320070.放電阻抗 xecl 雷射器 |
506500.320070.discharge impedance xecl laser |
5000.506500.320070.放電阻抗 xecl 雷射器.discharge impedance xecl laser.放電インピーダンス xecl レーザー -> 423 |
506500 |
|
| 16 |
506500320110 |
506500.320110.放電阻抗紫外線預電離 |
506500.320110.discharge impedance ultraviolet preionized |
5000.506500.320110.放電阻抗紫外線預電離.discharge impedance ultraviolet preionized.放電インピーダンス 紫外線予備電離 -> 24 |
506500 |
|
| 17 |
506500320120 |
506500.320120.放電電極修改 |
506500.320120.electrical discharges electrode modifications |
5000.506500.320120.放電電極修改.electrical discharges electrode modifications.放電電極の変更 -> 24 |
506500 |
|
| 18 |
506500320130 |
506500.320130.放電等離子通道 |
506500.320130.electrical discharges plasma channel |
5000.506500.320130.放電等離子通道.electrical discharges plasma channel.放電プラズマチャネル -> 24 |
506500 |
|
| 19 |
506500320140 |
506500.320140.放電電子密度的影響 |
506500.320140.electrical discharges influence of electron densit |
5000.506500.320140.放電電子密度的影響.electrical discharges influence of electron densit.放電、電子密度の影響 -> 24 |
506500 |
|
| 20 |
506500320150 |
506500.320150.放電滲透模擬 |
506500.320150.electrical discharges percolation simulation |
5000.506500.320150.放電滲透模擬.electrical discharges percolation simulation.放電パーコレーションシミュレーション -> 24 |
506500 |
|
| 21 |
506500320160 |
506500.320160.46.9 nm 雷射毛細管放電 |
506500.320160.46.9 nm laser capillary discharge |
5000.506500.320160.46.9 nm 雷射毛細管放電.46.9 nm laser capillary discharge.46.9 nm レーザー毛細管放電 -> 423 |
506500 |
|
| 22 |
506500320170 |
506500.320170.garpun mtw 放電控制 |
506500.320170.garpun mtw electric discharge control |
5000.506500.320170.garpun mtw 放電控制.garpun mtw electric discharge control.ガルプン mtw 放電制御 -> 24 |
506500 |
|
| 23 |
506500320210 |
506500.320210.krf 雷射放電控制 |
506500.320210.krf laser electric discharge control |
5000.506500.320210.krf 雷射放電控制.krf laser electric discharge control.krfレーザー放電制御 -> 423 |
506500 |
|
| 24 |
506500320220 |
506500.320220.krf 雷射放電泵浦 |
506500.320220.krf laser discharge pumping |
5000.506500.320220.krf 雷射放電泵浦.krf laser discharge pumping.Krf レーザー放電ポンピング -> 423 |
506500 |
|
| 25 |
506500320230 |
506500.320230.X 射線預電離 xecl 放電雷射器 |
506500.320230.x-ray preionised xecl discharge laser |
5000.506500.320230.X 射線預電離 xecl 放電雷射器.x-ray preionised xecl discharge laser.X線予備電離xecl放電レーザー -> 423 |
506500 |
|
| 26 |
506500320240 |
506500.320240.化學活性物質放電 |
506500.320240.chemically active species electrical discharges |
5000.506500.320240.化學活性物質放電.chemically active species electrical discharges.化学活性種の放電 -> 24 |
506500 |
|
| 27 |
506500320250 |
506500.320250.火花通道放電 |
506500.320250.spark channel electrical discharges |
5000.506500.320250.火花通道放電.spark channel electrical discharges.スパークチャンネルの放電 -> 24 |
506500 |
|
| 28 |
506500320260 |
506500.320260.火車放電 |
506500.320260.electric discharge by a train |
5000.506500.320260.火車放電.electric discharge by a train.電車による放電 -> 24 |
506500 |
|
| 29 |
506500320270 |
506500.320270.火星上的甲烷放電 |
506500.320270.methane on mars electrical discharges |
5000.506500.320270.火星上的甲烷放電.methane on mars electrical discharges.火星の放電におけるメタン -> 24 |
506500 |
|
| 30 |
506500320310 |
506500.320310.快速毛細管放電 |
506500.320310.fast capillary discharge |
5000.506500.320310.快速毛細管放電.fast capillary discharge.毛細管放電が速い -> 24 |
506500 |
|
| 31 |
506500320320 |
506500.320320.金屬蒸氣雷射放電室 |
506500.320320.metal vapor lasers discharge chambers |
5000.506500.320320.金屬蒸氣雷射放電室.metal vapor lasers discharge chambers.金属蒸気レーザー放電チャンバー -> 423 |
506500 |
|
| 32 |
506500320330 |
506500.320330.雷射拉曼診斷等離子體處理放電 |
506500.320330.laser raman diagnostics plasma processing discharg |
5000.506500.320330.雷射拉曼診斷等離子體處理放電.laser raman diagnostics plasma processing discharg.レーザーラマン診断プラズマ処理 |
506500 |
|
| 33 |
506500320340 |
506500.320340.放電的最小點火能量 |
506500.320340.minimum ignition energy electrical discharges |
5000.506500.320340.放電的最小點火能量.minimum ignition energy electrical discharges.最小点火エネルギー放電 -> 24 |
506500 |
|
| 34 |
506500320350 |
506500.320350.在長氣隙中放電 |
506500.320350.discharges in long air gaps |
5000.506500.320350.在長氣隙中放電.discharges in long air gaps.長い空隙での放電 -> 24 |
506500 |
|
| 35 |
506500320360 |
506500.320360.瞬態放電 |
506500.320360.transient electrical discharges |
5000.506500.320360.瞬態放電.transient electrical discharges.過渡放電 -> 24 |
506500 |
|
| 36 |
506500320370 |
506500.320370.小間隙放電 |
506500.320370.electrical discharges in small gaps |
5000.506500.320370.小間隙放電.electrical discharges in small gaps.小さな隙間での放電 -> 24 |
506500 |
|
| 37 |
506500320410 |
506500.320410.水中放電 |
506500.320410.electrical discharges in water |
5000.506500.320410.水中放電.electrical discharges in water.水中での放電 -> 24 |
506500 |
|
| 38 |
506500320420 |
506500.320420.雷電放電實驗室測試 |
506500.320420.lightning discharge laboratory tests |
5000.506500.320420.雷電放電實驗室測試.lightning discharge laboratory tests.雷放電の臨床検査 -> 24 |
506500 |
|
| 39 |
506500320430 |
506500.320430.狹縫陰極放電雷射作用 |
506500.320430.slot cathode discharge laser action |
5000.506500.320430.狹縫陰極放電雷射作用.slot cathode discharge laser action.スロットカソード放電レーザーアクション -> 423 |
506500 |
|
| 40 |
506500320440 |
506500.320440.大孔徑放電 krf |
506500.320440.wide aperture discharge krf |
5000.506500.320440.大孔徑放電 krf.wide aperture discharge krf.大口径放電krf -> 24 |
506500 |
|
| 41 |
506500320450 |
506500.320450.溫緻密物質毛細管放電激光 |
506500.320450.warm dense matter capillary discharge laser |
5000.506500.320450.溫緻密物質毛細管放電激光.warm dense matter capillary discharge laser.温密度物質毛細管放電レーザー -> 423 |
506500 |
|
| 42 |
506500320460 |
506500.320460.低電流放電 iii 型號 |
506500.320460.low current electrical discharges iii models |
5000.506500.320460.低電流放電 iii 型號.low current electrical discharges iii models.低電流放電 iii モデル -> 24 |
506500 |
|
| 43 |
506500320470 |
506500.320470.低電流放電的振盪 |
506500.320470.oscillations of low current electrical discharges |
5000.506500.320470.低電流放電的振盪.oscillations of low current electrical discharges.低電流放電の振動 -> 24 |
506500 |
|
| 44 |
506500320510 |
506500.320510.電子密度放電的影響 |
506500.320510.influence of electron density electrical discharge |
5000.506500.320510.電子密度放電的影響.influence of electron density electrical discharge.電子密度放電の影響 -> 24 |
506500 |
|
| 45 |
506500320520 |
506500.320520.電氣特性輝光放電 |
506500.320520.electrical characterization glow discharges |
5000.506500.320520.電氣特性輝光放電.electrical characterization glow discharges.電気的特性評価 グロー放電 -> 24 |
506500 |
|
| 46 |
506500320530 |
506500.320530.電漿通道放電 |
506500.320530.plasma channel electrical discharges |
5000.506500.320530.電漿通道放電.plasma channel electrical discharges.プラズマチャネルの放電 -> 24 |
506500 |
|
| 47 |
506500320540 |
506500.320540.軟 X 射線雷射光束毛細管放電 |
506500.320540.soft x-ray laser beam capillary discharge |
5000.506500.320540.軟 X 射線雷射光束毛細管放電.soft x-ray laser beam capillary discharge.軟X線、レーザービーム、毛細管放電 -> 42 |
506500 |
|
| 48 |
506500320550 |
506500.320550.熱不穩定性二氧化碳雷射放電 |
506500.320550.thermal instabilities co2 laser discharges |
5000.506500.320550.熱不穩定性二氧化碳雷射放電.thermal instabilities co2 laser discharges.熱不安定性 CO2 レーザー放電 -> 423 |
506500 |
|
| 49 |
506500320560 |
506500.320560.平行平面電極放電 |
506500.320560.parallel plane electrodes electrical discharges |
5000.506500.320560.平行平面電極放電.parallel plane electrodes electrical discharges.平行平面電極の放電 -> 24 |
506500 |
|
| 50 |
506500320570 |
506500.320570.脈衝氣體雷射電弧放電 |
506500.320570.pulsed gas laser arc discharge |
5000.506500.320570.脈衝氣體雷射電弧放電.pulsed gas laser arc discharge.パルスガスレーザーアーク放電 -> 423 |
506500 |
|
| 51 |
506500320580 |
506500.320580.模擬研究毛細管放電雷射器 |
506500.320580.simulation study capillary discharge laser |
5000.506500.320580.模擬研究毛細管放電雷射器.simulation study capillary discharge laser.シミュレーション研究 毛細管放電レーザー -> 4 |
506500 |
|
| 52 |
506500320610 |
506500.320610.毛細管放電等離子柱 |
506500.320610.capillary discharge plasma column |
5000.506500.320610.毛細管放電等離子柱.capillary discharge plasma column.毛細管放電血漿カラム -> 24 |
506500 |
|
| 53 |
506500320620 |
506500.320620.預電離放電 xecl 雷射器 |
506500.320620.preionized discharge xecl laser |
5000.506500.320620.預電離放電 xecl 雷射器.preionized discharge xecl laser.予備電離放電 xecl レーザー -> 423 |
506500 |
|
| 54 |
506500320630 |
506500.320630.放電形成流光 |
506500.320630.electrical discharges formation of streamers |
5000.506500.320630.放電形成流光.electrical discharges formation of streamers.放電によるストリーマの形成 -> 24 |
506500 |
|
| 55 |
506500320640 |
506500.320640.流光放電的形成 |
506500.320640.formation of streamers electrical discharges |
5000.506500.320640.流光放電的形成.formation of streamers electrical discharges.ストリーマ放電の形成 -> 24 |
506500 |
|
| 56 |
506500320650 |
506500.320650.參數限制二氧化碳雷射放電 |
506500.320650.parameter limits co2 laser discharges |
5000.506500.320650.參數限制二氧化碳雷射放電.parameter limits co2 laser discharges.パラメータ制限 CO2 レーザー放電 -> 423 |
506500 |
|
| 57 |
506500320660 |
506500.320660.實驗室模擬放電 |
506500.320660.lab simulation electrical discharges |
5000.506500.320660.實驗室模擬放電.lab simulation electrical discharges.実験室での放電シミュレーション -> 24 |
506500 |
|
| 58 |
506500320670 |
506500.320670.擴展等離子體通道放電控制 |
506500.320670.extended plasma channels electric discharge contro |
5000.506500.320670.擴展等離子體通道放電控制.extended plasma channels electric discharge contro.拡張されたプラズマ チャネルの放電 |
506500 |
|
| 59 |
506500320710 |
506500.320710.滲流模擬放電 |
506500.320710.percolation simulation electrical discharges |
5000.506500.320710.滲流模擬放電.percolation simulation electrical discharges.パーコレーションシミュレーション、放電 -> 24 |
506500 |
|
| 60 |
506500320720 |
506500.320720.靜電放電基因的數值模擬 |
506500.320720.numerical modeling of electrostatic discharge gene |
5000.506500.320720.靜電放電基因的數值模擬.numerical modeling of electrostatic discharge gene.静電気放電遺伝子の数値モデリング - |
506500 |
|
| 61 |
506500320730 |
506500.320730.體積放電高能量分子雷射 |
506500.320730.volume discharge high energy molecular lasers |
5000.506500.320730.體積放電高能量分子雷射.volume discharge high energy molecular lasers.体積放電高エネルギー分子レーザー -> 423 |
506500 |
|
| 62 |
506500320740 |
506500.320740.點火過程放電 |
506500.320740.ignition processes electrical discharges |
5000.506500.320740.點火過程放電.ignition processes electrical discharges.点火プロセスの放電 -> 24 |
506500 |
|
| 63 |
506500320750 |
506500.320750.氮氣毛細管放電 |
506500.320750.nitrogen capillary discharge |
5000.506500.320750.氮氣毛細管放電.nitrogen capillary discharge.窒素の毛細管放出 -> 24 |
506500 |
|
| 64 |
506500330010 |
506500.330010.雷射系統設施模組 |
506500.330010.laser system facility module |
5000.506500.330010.雷射系統設施模組.laser system facility module.レーザーシステム設備モジュール -> 423 |
506500 |
|
| 65 |
506500330020 |
506500.330020.雷射光學系統 |
506500.330020.optical system for laser |
5000.506500.330020.雷射光學系統.optical system for laser.レーザー用光学システム -> 423 |
506500 |
|
| 66 |
506500330030 |
506500.330030.雷射功率藻類 gaas 異質結構 |
506500.330030.laser power algaas gaas heterostructures |
5000.506500.330030.雷射功率藻類 gaas 異質結構.laser power algaas gaas heterostructures.レーザーパワー藻類gaasヘテロ構造 -> 4 |
506500 |
|
| 67 |
506500330040 |
506500.330040.雷射功率密度 gaas |
506500.330040.laser power density gaas |
5000.506500.330040.雷射功率密度 gaas.laser power density gaas.レーザー出力密度gaas -> 423 |
506500 |
|
| 68 |
506500330050 |
506500.330050.雷射功率轉換器 |
506500.330050.laser power converters |
5000.506500.330050.雷射功率轉換器.laser power converters.レーザーパワーコンバーター -> 423 |
506500 |
|
| 69 |
506500330060 |
506500.330060.雷射照明異常螢光 |
506500.330060.laser illumination anomalous fluorescence |
5000.506500.330060.雷射照明異常螢光.laser illumination anomalous fluorescence.レーザー照明・異常蛍光 -> 423 |
506500 |
|
| 70 |
506500330070 |
506500.330070.雷射照射熱分解 |
506500.330070.laser illumination thermal decomposition |
5000.506500.330070.雷射照射熱分解.laser illumination thermal decomposition.レーザー照射の熱分解 -> 423 |
506500 |
|
| 71 |
506500330110 |
506500.330110.雷射照明表面結構 |
506500.330110.laser illumination surface structures |
5000.506500.330110.雷射照明表面結構.laser illumination surface structures.レーザー照明の表面構造 -> 423 |
506500 |
|
| 72 |
506500330120 |
506500.330120.雷射照射聚合相 |
506500.330120.laser illumination polymerized phase |
5000.506500.330120.雷射照射聚合相.laser illumination polymerized phase.レーザー照射の重合相 -> 423 |
506500 |
|
| 73 |
506500330130 |
506500.330130.雷射照明鈉 d 線 |
506500.330130.laser illumination sodium d lines |
5000.506500.330130.雷射照明鈉 d 線.laser illumination sodium d lines.レーザー照射 ナトリウム d ライン -> 423 |
506500 |
|
| 74 |
506500330140 |
506500.330140.雷射照射鈉蒸氣 |
506500.330140.laser illumination sodium vapour |
5000.506500.330140.雷射照射鈉蒸氣.laser illumination sodium vapour.レーザー照射 ナトリウム蒸気 -> 423 |
506500 |
|
| 75 |
506500330150 |
506500.330150.雷射照明 c60 晶體 |
506500.330150.laser illumination c60 crystals |
5000.506500.330150.雷射照明 c60 晶體.laser illumination c60 crystals.レーザー照明 c60 クリスタル -> 423 |
506500 |
|
| 76 |
506500330160 |
506500.330160.雷射照明異常行為 |
506500.330160.laser illumination anomalous behaviour |
5000.506500.330160.雷射照明異常行為.laser illumination anomalous behaviour.レーザー照射の異常な動作 -> 423 |
506500 |
|
| 77 |
506500330170 |
506500.330170.雷射照明泡棉銅 |
506500.330170.laser illumination copper foams |
5000.506500.330170.雷射照明泡棉銅.laser illumination copper foams.レーザー照射銅発泡体 -> 423 |
506500 |
|
| 78 |
506500330210 |
506500.330210.雷射照明條件 |
506500.330210.laser illumination conditions |
5000.506500.330210.雷射照明條件.laser illumination conditions.レーザー照射条件 -> 423 |
506500 |
|
| 79 |
506500330220 |
506500.330220.雷射設施初步設計 |
506500.330220.laser facility preliminary design |
5000.506500.330220.雷射設施初步設計.laser facility preliminary design.レーザー施設の予備設計 -> 423 |
506500 |
|
| 80 |
506500330230 |
506500.330230.雷射設施開發進展 |
506500.330230.laser facility development progress |
5000.506500.330230.雷射設施開發進展.laser facility development progress.レーザー施設開発の進捗状況 -> 423 |
506500 |
|
| 81 |
506500330240 |
506500.330240.雷射設備相關技術開發 |
506500.330240.laser facility related technology development |
5000.506500.330240.雷射設備相關技術開發.laser facility related technology development.レーザー施設関連技術開発 -> 423 |
506500 |
|
| 82 |
506500330250 |
506500.330250.雷射耦合點火裝置 |
506500.330250.laser coupling ignition facility |
5000.506500.330250.雷射耦合點火裝置.laser coupling ignition facility.レーザーカップリング点火設備 -> 423 |
506500 |
|
| 83 |
506500330260 |
506500.330260.garpun mtw krf 雷射系統 |
506500.330260.garpun mtw krf laser system |
5000.506500.330260.garpun mtw krf 雷射系統.garpun mtw krf laser system.ガープン mtw krf レーザー システム -> 423 |
506500 |
|
| 84 |
506500330270 |
506500.330270.紫外線雷射作用 |
506500.330270.he ag ultraviolet laser action |
5000.506500.330270.紫外線雷射作用.he ag ultraviolet laser action.He ag 紫外線レーザー アクション -> 423 |
506500 |
|
| 85 |
506500330310 |
506500.330310.mrf 應用高功率雷射 |
506500.330310.mrf applications high power lasers |
5000.506500.330310.mrf 應用高功率雷射.mrf applications high power lasers.mrf アプリケーション高出力レーザー -> 423 |
506500 |
|
| 86 |
506500330320 |
506500.330320.pmda oda 紫外線雷射照射 |
506500.330320.pmda oda ultraviolet laser irradiation |
5000.506500.330320.pmda oda 紫外線雷射照射.pmda oda ultraviolet laser irradiation.PMDA ODA 紫外線レーザー照射 -> 423 |
506500 |
|
| 87 |
506500330330 |
506500.330330.xecl 雷射尖峰維持器 |
506500.330330.xecl lasers spiker sustainer |
5000.506500.330330.xecl 雷射尖峰維持器.xecl lasers spiker sustainer.xecl レーザー スパイカー サスティナー -> 423 |
506500 |
|
| 88 |
506500330340 |
506500.330340.xecl 雷射磁脈衝壓縮器 |
506500.330340.xecl lasers magnetic pulse compressor |
5000.506500.330340.xecl 雷射磁脈衝壓縮器.xecl lasers magnetic pulse compressor.xecl レーザー磁気パルス コンプレッサー -> 423 |
506500 |
|
| 89 |
506500330350 |
506500.330350.XECL 雷射放電穩定性 |
506500.330350.xecl lasers discharge stability |
5000.506500.330350.XECL 雷射放電穩定性.xecl lasers discharge stability.xecl レーザー放電の安定性 -> 423 |
506500 |
|
| 90 |
506500330360 |
506500.330360.xecl 雷射放電預電離均勻性 |
506500.330360.xecl laser discharges preionization on uniformity |
5000.506500.330360.xecl 雷射放電預電離均勻性.xecl laser discharges preionization on uniformity.xecl レーザー放電による均 |
506500 |
|
| 91 |
506500330370 |
506500.330370.可調諧固態雷射吡咯亞甲基染料 |
506500.330370.tunable solid state lasers pyrromethene dyes |
5000.506500.330370.可調諧固態雷射吡咯亞甲基染料.tunable solid state lasers pyrromethene dyes.調整可能な固体レーザーピロメテン色素 -> |
506500 |
|
| 92 |
506500330410 |
506500.330410.快速軸流二氧化碳雷射 |
506500.330410.fast axial flow co2 laser |
5000.506500.330410.快速軸流二氧化碳雷射.fast axial flow co2 laser.高速軸流 CO2 レーザー -> 423 |
506500 |
|
| 93 |
506500330420 |
506500.330420.改良羅丹明固態染料雷射 |
506500.330420.modified rhodamine solid state dye lasers |
5000.506500.330420.改良羅丹明固態染料雷射.modified rhodamine solid state dye lasers.修飾ローダミン固体色素レーザー -> 423 |
506500 |
|
| 94 |
506500330430 |
506500.330430.稀土金屬雷射作用 |
506500.330430.rare earth metal laser action |
5000.506500.330430.稀土金屬雷射作用.rare earth metal laser action.希土類金属レーザーアクション -> 423 |
506500 |
|
| 95 |
506500330440 |
506500.330440.強度測量 xecl 激光 |
506500.330440.intensity measurements xecl laser |
5000.506500.330440.強度測量 xecl 激光.intensity measurements xecl laser.強度測定 xecl レーザー -> 423 |
506500 |
|
| 96 |
506500330450 |
506500.330450.極高循環穩定性二氧化碳雷射器 |
506500.330450.extremely high cycling stability co2 laser |
5000.506500.330450.極高循環穩定性二氧化碳雷射器.extremely high cycling stability co2 laser.非常に高いサイクル安定性 CO2 レーザー - |
506500 |
|
| 97 |
506500330510 |
506500.330510.二氧化碳雷射還原氧化石墨烯 |
506500.330510.co2 laser reduction of graphene oxide |
5000.506500.330510.二氧化碳雷射還原氧化石墨烯.co2 laser reduction of graphene oxide.CO2 レーザーによる酸化グラフェンの還元 -> 423 |
506500 |
|
| 98 |
506500330520 |
506500.330520.二氧化碳雷射光控吸收 |
506500.330520.co2 laser optically controlled absorption |
5000.506500.330520.二氧化碳雷射光控吸收.co2 laser optically controlled absorption.CO2 レーザーの光学的に制御された吸収 -> 423 |
506500 |
|
| 99 |
506500330530 |
506500.330530.co2 雷射高離子電導率 |
506500.330530.co2 laser high ionic conductivity |
5000.506500.330530.co2 雷射高離子電導率.co2 laser high ionic conductivity.CO2 レーザーの高いイオン伝導性 -> 423 |
506500 |
|
| 100 |
506500330540 |
506500.330540.二氧化碳雷射週期軌道 |
506500.330540.co2 laser periodic orbits |
5000.506500.330540.二氧化碳雷射週期軌道.co2 laser periodic orbits.CO2 レーザーの周期軌道 -> 423 |
506500 |
